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NDS8858H Datasheet, PDF (1/12 Pages) Fairchild Semiconductor – Complementry MOSFET Half Bridge
July 1996
NDS8858H
Complementary MOSFET Half Bridge
General Description
These Complementary MOSFET half bridge devices are
produced using Fairchild's proprietary, high cell density,
DMOS technology. This very high density process is
especially tailored to minimize on-state resistance, provide
superior switching performance, and withstand high energy
pulses in the avalanche and commutation modes. These
devices are particularly suited for low voltage half bridge
applications or CMOS applications when both gates are
connected together.
Features
N-Channel 6.3A, 30V, RDS(ON)=0.035Ω @ VGS=10V.
P-Channel -4.8A, -30V, RDS(ON)=0.065Ω @ VGS=-10V.
High density cell design or extremely low RDS(ON).
High power and current handling capability in a widely used
surface mount package.
Matched pair for equal input capacitance and power capability
.
________________________________________________________________________________
P-Gate
N -Gate
V+
Vout
Vout
Vout
Vout
V-
Absolute Maximum Ratings TA= 25°C unless otherwise noted
Symbol Parameter
N-Channel
VDSS
Drain-Source Voltage
30
VGSS
Gate-Source Voltage
20
ID
Drain Current - Continuous
(Note 1a &2)
6.3
- Pulsed
20
PD
Maximum Power Dissipation
(Single Device)
(Note 1a)
(Note 1b)
(Note 1c)
TJ,TSTG Operating and Storage Temperature Range
THERMAL CHARACTERISTICS
RθJA
RθJC
Thermal Resistance, Junction-to-Ambient
(Single Device)
(Note 1a)
Thermal Resistance, Junction-to-Case
(Single Device)
(Note 1a)
2.5
1.2
1
-55 to 150
50
25
P-Channel
-30
-20
-4.8
20
Units
V
V
A
W
°C
°C/W
°C/W
© 1997 Fairchild Semiconductor Corporation
NDS8858H Rev. C